Thermally stable silicon nitride material

Compositions: ceramic – Ceramic compositions – Refractory

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

264332, 264 65, 501152, 501154, C04B 3558

Patent

active

043884148

ABSTRACT:
A thermally stable, oxidation resistant ceramic Si.sub.3 N.sub.4 material is disclosed. The material has a substantially pure primary phase formed of substantially pure silicon nitride. A substantially pure secondary phase of the material is formed of a material selected from the group consisting essentially of Si.sub.3 N.sub.4 /SiO.sub.2 /4Y.sub.2 O.sub.3, Si.sub.3 N.sub.4 /SiO.sub.2 /2Y.sub.2 O.sub.3 and Si.sub.3 N.sub.4 /4SiO.sub.2 /5Y.sub.2 O.sub.3. The primary phase may be in the form of individual grains and the secondary phase may be in the form of grain boundaries between the individual grains.

REFERENCES:
patent: 4102698 (1978-07-01), Lange et al.
patent: 4264548 (1981-04-01), Ezis
patent: 4264550 (1981-04-01), Ezis
patent: 4280850 (1981-07-01), Smith et al.
patent: 4285895 (1981-08-01), Mangels et al.
patent: 4323325 (1982-04-01), Samanta et al.
patent: 4341874 (1982-07-01), Nishida et al.
patent: 4354990 (1982-10-01), Martinengo et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thermally stable silicon nitride material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thermally stable silicon nitride material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermally stable silicon nitride material will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-164317

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.