Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal
Patent
1976-01-23
1977-12-20
Mars, Howard T.
Chemistry of carbon compounds
Miscellaneous organic carbon compounds
C-metal
252466J, 48214A, C07C 104, C07C 112
Patent
active
040641520
ABSTRACT:
Nickel-alumina catalysts having a remarkably high degree of thermal stability, and active for the hydrogenation of carbon oxides (methanation), are prepared by a novel "precipitative-occlusion" method. This method involves digesting a slurry of an alumina hydrate in an aqueous solution of an amino complex of a nickel salt. The digestion is carried out at a temperature sufficiently high to decompose the amino complex and "release" the nickel (II) ions. This results in a gradual precipitation of nickel hydroxide in the pores and interstices formed by the agglomerating particles of alumina hydrate. The coflocculated solids are recovered as by filtration, washed, dried and calcined. The resulting compositions are found, in high temperature reactions such as methanation, to retain their activity for much longer periods of time than do conventional nickel-alumina catalysts prepared by the most widely used prior art technique, viz., coprecipitation.
REFERENCES:
patent: 3156657 (1964-11-01), Pinder et al.
patent: 3361535 (1968-01-01), Pollitzer et al.
patent: 3379505 (1968-04-01), Holmes et al.
patent: 3450514 (1969-06-01), Sinfelt et al.
patent: 3549556 (1970-12-01), Dienes
patent: 3890113 (1975-06-01), Child
Hartman Richard C.
Henderson Lannas S.
Mars Howard T.
Sandford Dean
Union Oil Company of California
LandOfFree
Thermally stable nickel-alumina catalysts useful for methanation does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thermally stable nickel-alumina catalysts useful for methanation, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermally stable nickel-alumina catalysts useful for methanation will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-599530