Thermally stable highly sensitive resists and the like

Details Thermally stable highly sensitive resists and the like Thermally stable highly sensitive resists and the like

1991-07-01

1994-05-24

Kight, III, John

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

528125, 528126, 528128, 528170, 528172, 528173, 528176, 528185, 528188, 528220, 528229, 528352, 522164, 430281, 430283, C08G 6926, C08G 7310

Patent

active

053149882

ABSTRACT:
A process for forming a polymer (and the polymer formed thereby) for passivation, resist and bonding uses, for example, that is thermally stable at relatively high temperatures in excess of 400.degree. C., but is sensitive to electromagnetic radiation. The process includes forming a heteroatom ring polymer that includes a chain formed of a large number of closed aromatic rings such as polyimide groups. According to the present teaching, intervening moieties, (that is, chemical groupings) in the form of open ring precursors of the aromatic rings, such as polyamic acid groups are introduced between the successive closed aromatic rings, which destroy and/or delimit the colinear character and the coplanar character typical of the successive aromatic rings, thus rendering the aromatic rings sensitive to structural change by electromagnetic radiation exposure, and soluble in common organic solvents, but with the exposed HRP insoluble in resist developers.

REFERENCES:
patent: 3356648 (1967-12-01), Rogers
patent: 3658938 (1972-04-01), Kwiatkowski et al.
patent: 3803081 (1974-04-01), Lubowitz
patent: 4063984 (1977-12-01), Critchley
patent: 4526838 (1985-07-01), Fujioka et al.
patent: 4666735 (1987-05-01), Hoover et al.
"Poly(arylene Imide)s as E-Beam Resist: Sensitivity and Resolution", Journal of Polymer Science, Part A: Polymer Chemistry, vol. 27, pp. 3343-3352, (1989), Chien et al.

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