Thermally-generated mask pattern

Details Thermally-generated mask pattern Thermally-generated mask pattern

2006-07-18

2006-07-18

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07078136

ABSTRACT:
A mask having a first region and a second region; the first region having a multilayer mirror over a substrate, the multilayer mirror having alternating layers of a first material and a second material, the first material having a high index of refraction, the second material having a low index of refraction; and the second region having a compound of the first material and the second material over the substrate.

REFERENCES:
patent: 4393127 (1983-07-01), Greschner et al.
patent: 5429896 (1995-07-01), Hasegawa et al.
patent: 5503950 (1996-04-01), Miyake et al.
patent: 6178221 (2001-01-01), Levinson et al.

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