Thermally development imaging materials having backside...

Details Thermally development imaging materials having backside... Thermally development imaging materials having backside...

2006-08-22

2006-08-22

Chea, Thorl (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

C430S510000, C430S512000, C430S607000, C430S613000, C430S614000, C430S619000, C430S623000, C430S961000

Reexamination Certificate

active

07094524

ABSTRACT:
Thermally developable photothermographic materials comprise a backside layer that includes a backside stabilizer to reduce fog formation in high humidity conditions, thereby providing improved shelf stability. Useful backside stabilizers include an amine organic base whose conjugate acid has a pKa greater than 5. These backside stabilizers can be provided particularly in non-photosensitive compositions that include an antihalation composition.

REFERENCES:
patent: 4212937 (1980-07-01), Akashi et al.
patent: 6063560 (2000-05-01), Suzuki et al.
patent: 6465162 (2002-10-01), Kong et al.
patent: 6599685 (2003-07-01), Kong
patent: 0 708 086 (1996-04-01), None
patent: 1096310 (2001-06-01), None
patent: 1186950 (2002-03-01), None
patent: 2002-328446 (2002-11-01), None
patent: 2003-21883 (2003-01-01), None
K. Sakizadeh,Journal of Imaging Sci. Technol., 2003, 47(3), pp. 263-277.

Affiliated with

Also associated with

Rating

Thermally development imaging materials having backside... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thermally development imaging materials having backside..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermally development imaging materials having backside... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3617895