Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified radiation sensitive composition with color...
Patent
1988-05-03
1989-06-06
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified radiation sensitive composition with color...
430607, 430611, 430614, 430615, 430617, 430957, G03C 106
Patent
active
048371416
ABSTRACT:
A thermally developable light-sensitive material is disclosed that the said material has at least one light-sensitive silver halide containing layer on a support and which further contains a compound represented by the general formula (I):
REFERENCES:
patent: 3832186 (1974-08-01), Masuda et al.
patent: 4511644 (1985-04-01), Okamura et al.
patent: 4546073 (1985-10-01), Bergtholler et al.
patent: 4546075 (1985-10-01), Kitaguchi et al.
patent: 4584257 (1986-04-01), Okamura et al.
patent: 4607004 (1986-08-01), Ikenoue et al.
patent: 4610957 (1986-09-01), Kato et al.
Goto Sohei
Iwagaki Masaru
Kohno Junichi
Komamura Tawara
Okauchi Ken
Bierman Jordan B.
Doody Patrick A.
Konishiroku Photo Industry Co,., Ltd.
Michl Paul R.
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