Thermally controlled sputtering of high anisotropy magnetic mate

Details Thermally controlled sputtering of high anisotropy magnetic mate Thermally controlled sputtering of high anisotropy magnetic mate

1984-02-07

1984-11-27

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192R, 204298, C23C 1500

Patent

active

044849958

ABSTRACT:
A substrate coating of a ferromagnetic alloy of a rare earth-transition element mixture is prepared by a hollow cathode sputtering deposition method to produce near single domain films on various substrates.

REFERENCES:
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patent: 4324631 (1982-04-01), Meckel et al.
patent: 4347086 (1982-08-01), Chraplyvy
patent: 4347112 (1982-08-01), Togami
patent: 4367253 (1983-01-01), Arai et al.
Egorov et al., Chem. Abst. 86 (1977), #164379g.
Hirono et al., Chem. Abst. 95 (1981), #12514l.
Zhang et al., Chem. Abst. 95 (1981), #107508k.
Chem. Abst. 10th Collective Index, pp. 15034-15037, 27816-27817.

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