Thermal vapor deposition apparatus

Details Thermal vapor deposition apparatus Thermal vapor deposition apparatus

1992-06-16

1994-01-18

Pal, Asok

Coating apparatus

Gas or vapor deposition

With treating means

118724, C23C 1400, C23C 1600

Patent

active

052796710

ABSTRACT:
An improvement in a thermal vapor disposition apparatus having an enclosure with a gas inlet, a gas outlet, side walls, a susceptor, gas flow means for causing a flow of gas from the inlet to the outlet and heating means for heating the susceptor, where a temperature gradient is imposed on the susceptor and/or a temperature control means controls the temperature profile of the side walls.

REFERENCES:
patent: 3790620 (1973-07-01), Eversteijn et al.
patent: 4535227 (1985-08-01), Shimizu
patent: 4535228 (1985-08-01), Mimura et al.
patent: 4651673 (1987-03-01), Muething
patent: 5133286 (1992-07-01), Choo et al.

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