Thermal tuning of a laser using doped silicon etalon

Details Thermal tuning of a laser using doped silicon etalon Thermal tuning of a laser using doped silicon etalon

2006-09-12

2006-09-12

Hughes, Deandra M. (Department: 3663)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C372S020000

Reexamination Certificate

active

07106487

ABSTRACT:
In embodiments of the invention, a wavelength-selective device is doped with n-type or p-type material to make the single-crystal silicon in the active region of the device electrically conductive. An electrically conductive and thermally conductive active region allows an external heater such as a platinum heater strip to be eliminated and current to be applied directly to the single-crystal silicon to thermally tune the laser.

REFERENCES:
patent: 5907420 (1999-05-01), Chraplyvy et al.
patent: 6356689 (2002-03-01), Greywall
patent: 6787894 (2004-09-01), Jeung et al.
patent: 6804278 (2004-10-01), Daiber et al.
patent: 2002/0090011 (2002-07-01), Pezeshki et al.
patent: 2002/0155619 (2002-10-01), Kurihara et al.
patent: 2003/0015729 (2003-01-01), Bosco et al.
Niemi et al. Tunable Silicon Etalon for Simultaneous Spectral Filtering and Wavelength of a DWDM Transmitter. IEEE Photonics Technology Letters. vol. 13, No. 1. Jan. 2001. pp. 58-60.
Neustroev et al. Hundred MEV Ion Irradiation Effect of Dopant Depth Profiles in Silicon. Semiconductor Conference, 1998. vol. 2. pp. 641-644.
Silvast, William T. Laser Fundamentals. 2nd Edition. Cambridge University Press. 2004. p. 478.

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