Refrigeration – Low pressure cold trap process and apparatus
Patent
1992-07-30
1994-04-19
Bennet, Henry A.
Refrigeration
Low pressure cold trap process and apparatus
62 8, 62 12, B01D 800
Patent
active
053035585
ABSTRACT:
A semiconductor deposition system with thermal trap characterized by a processing chamber, a source of process gas coupled to an inlet of the processing chamber, a thermal trap coupled to an outlet of the processing chamber, and a pump mechanism operative to pump a gas from the process chamber and into the thermal trap. The thermal trap preferably includes an enclosure defining a trap chamber, where an inlet to the trap chamber is coupled to the outlet of the processing chamber, a condensable-solid collection surface located within the trap chamber, a mechanism for maintaining the temperature of the collection surface at or below the temperature at which a gas flowing into the chamber condenses into a solid form, and a mechanism for maintaining the temperature of an inner surface of the enclosure at a temperature above which the gas condenses into a solid form. A method for trapping a gaseous material is characterized by the steps of flowing a gaseous material into a chamber of an enclosure, and maintaining the temperature of a collection surface disposed within the chamber at or below the temperature at which the gaseous material condenses into a solid form. The method preferably also includes the step of maintaining the temperature of an inner surface of the enclosure above the temperature at which the gaseous material condenses into a solid.
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Bellows Craig A.
Caton Oscar L.
Hebert, Jr. Curtis M.
Schaper Steve J.
Bennet Henry A.
Kilner C.
VLSI Technology Inc.
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