Thermal transfer printer for producing a photomask

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430300, 430302, 430309, G03F 100, G03F 700

Patent

active

049817655

ABSTRACT:
The invention relates to the use of a thermal transfer printer and of an ink ribbon containing a pigment or dye that absorbs light in the range from 350 to 450 nm for the direct production of a photomask from an electronically coded sources of information on a metal plate (PS plate) coated with a positively working photopolymer which is sensitive to light in the range from 350 to 450 nm, and, as surface layer, with a polymer which is soluble in alkaline solution and is permeable to light in the range from 350 to 450 nm, such that the image produced by the thermal transfer printer on the PS plate is used direct as photomask.

REFERENCES:
patent: 2146515 (1939-02-01), Schmidt
patent: 3697677 (1972-10-01), Newman
patent: 4200675 (1980-04-01), Flor et al.
patent: 4410562 (1983-10-01), Nemoto et al.
patent: 4429027 (1984-01-01), Chambers, Jr. et al.
patent: 4555471 (1985-11-01), Barzynski et al.
patent: 4568621 (1986-02-01), Aviram et al.
patent: 4695527 (1987-09-01), Geissler et al.
patent: 4853317 (1989-08-01), Hayes
Xerox Disclosure Journal., vol. 8, No. 2, Mar./Apr. 1985, p. 91.
Patent Abst. of Japan, vol. 5, No. 36 (p. 51) [708], Mar. 7, 1981.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thermal transfer printer for producing a photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thermal transfer printer for producing a photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal transfer printer for producing a photomask will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1995599

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.