Metal founding – Miscellaneous – apparatus
Patent
1994-09-19
1995-07-04
Lin, Kuang Y.
Metal founding
Miscellaneous, apparatus
1643381, 1641221, 366903, 432251, B22D 2704
Patent
active
054291763
ABSTRACT:
A thermal radiation baffle for apparatus for use in directional solidification of crystalline material, to be mounted at one end of a furnace, and to allow a mould containing the material in molten form to pass through, has at least one clamped layer of interconnected flexible strips of refractory material. Each such layer has an ordered construction, for example, with the strips being interwoven, or knitted; and has one or more slits therein. At least substantially the whole of each slit is inclined at a significant angle to the strips, so that the strips do not become detached or worn in use, but the layer is capable of resiliently engaging the sides of, for example, an irregularly shaped mould. A slit may be provided between two separate, but adjacent, pieces of the layer.
REFERENCES:
patent: 3714977 (1973-02-01), Terkelsen
patent: 3841384 (1974-10-01), Tingquist et al.
patent: 4108236 (1978-08-01), Salkeld
patent: 4353688 (1982-10-01), Ahner
patent: 4757856 (1988-07-01), George
patent: 4773467 (1988-09-01), Graham et al.
patent: 4969501 (1990-11-01), Brokloff
patent: 5013393 (1991-05-01), Schwirtlich et al.
patent: 5066223 (1991-11-01), Mosch
Part III Engineering Materials, The Science & Engineering of Materials, by Donald R. Askeland, Jun. 1989 pp. 519, 525.
Atkinson Alan W.
Walsh Melanie J.
Lin Kuang Y.
T&N Technology Limited
LandOfFree
Thermal radiation baffle for apparatus for use in directional so does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thermal radiation baffle for apparatus for use in directional so, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal radiation baffle for apparatus for use in directional so will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-754741