Thermal processing system and methods for forming low-k...

Details Thermal processing system and methods for forming low-k... Thermal processing system and methods for forming low-k...

2005-01-04

2005-01-04

Talbot, Brian K. (Department: 1762)

Coating processes

Electrical product produced

C427S240000, C427S372200, C427S374100, C427S379000, C427S385500, C427S398400, C427S350000

Reexamination Certificate

active

06838115

ABSTRACT:
Single wafer processing methods and systems for manufacturing films having low-k properties and low indices of refraction. The methods incorporate a processing station in which both curing and post-cure, in situ gas cooling take place.

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