Radiation imagery chemistry: process – composition – or product th – Combined
Patent
1998-01-28
2000-03-21
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Combined
430330, 219443, 454187, 553852, H01L 21027, H01L 2130
Patent
active
060401206
ABSTRACT:
A substrate processing apparatus and a thermal processing apparatus are capable of creating a pattern with an excellent line width uniformity. An ACU conditions air to a temperature and a humidity which are suitable to processing which uses a resist of chemical thickening type, while an ammonia removing filter removes an ammonia component from the air and the air is supplied to an air supply pipe which branches off. A pump, a flow meter and a pressure regulator are disposed to an air supply pipe, so that the air from the ACU, as it is conditioned to flow at a constant flow rate and with a pressure, is supplied to a PEB bake unit. Since the temperature and the humidity of an atmosphere within the PEB bake unit stabilize at values which are suitable to processing which uses a resist of chemical thickening type, it is possible to form a pattern with an excellent line width uniformity. At the same time, it is possible to suppress a development failure since the atmosphere contains a reduced quantity of ammonia component.
REFERENCES:
patent: 5039321 (1991-08-01), Satoh et al.
patent: 5096477 (1992-03-01), Shinoda et al.
"Airborne Chemical Contamination of a Chemically Amplified Resist", MacDonald et al., SPIE vol. 1466 Advances in Resist Tech. and Process. VIII pp. 2-12, 1991.
"Development of Ammonia Adsorption Filter and its Application to LSI Manufacturing Environment", Saiki et al., J. Photopolymers Sci. and Tech. vol. 8 No. 4 pp. 599-606, 1995.
English language Abstract of JP 9-320930, "Pattern Forming Method and Pattern Forming Device" Yamada et al., Dec. 1997.
Matsushita Masanao
Taniguchi Hideyuki
Dainippon Screen Mfg. Co,. Ltd.
McPherson John A.
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