Thermal process station with heated lid

Details Thermal process station with heated lid Thermal process station with heated lid

2005-04-26

2005-04-26

Wilson, Gregory (Department: 3749)

Heating

Heating or heat retaining work chamber structure

Door, cover or port

C432S253000, C118S728000, C219S457100

Reexamination Certificate

active

06884066

ABSTRACT:
Methods and apparatuses to improve the temperature uniformity of a workpiece being processed on a heated platen of a thermal processing station. A heated platen is enclosed in a housing incorporating an additional heat source that uniformly outputs thermal energy into the process chamber in which the heated platen is positioned. In preferred embodiments, this heat source is positioned in the lid of the housing. It is additionally preferred that the heated lid includes features that provide a gas flow path to introduce to and/or purge gas from the process chamber. In terms of photoresist performance, the improved thermal uniformity provided by using such an additional heat source in the housing, e.g., in the lid, offers improved line width control and line uniformity across a wafer.

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