Thermal plasma annealing system, and annealing process

Details Thermal plasma annealing system, and annealing process Thermal plasma annealing system, and annealing process

1998-11-05

2000-10-10

Walberg, Teresa

Electric heating

Metal heating

By arc

117 87, 427571, B23K 900

Patent

active

061303976

ABSTRACT:
A thermal plasma annealing system comprises a radiation irradiation means for irradiating a thin film formed on a substrate with heat or radiation emitted from a thermal plasma. This annealing system enables a material relatively sensitive to high heat such as glass to be used as a substrate, and can lend itself to a large amount of annealing treatments on a mass-production scale, yielding consistent annealing quality.

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