Thermal management and method for large scale processing of...

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S064000, C136S265000, C257SE21001

Reexamination Certificate

active

08084292

ABSTRACT:
The thermal management and method for large scale processing of CIS and/or CIGS based thin film overlaying glass substrates. According to an embodiment, the present invention provides a method for fabricating a copper indium diselenide semiconductor film. The method includes providing a plurality of substrates, each of the substrates having a copper and indium composite structure. The method also includes transferring the plurality of substrates into a furnace, each of the plurality of substrates provided in a vertical orientation with respect to a direction of gravity, the plurality of substrates being defined by a number N, where N is greater than 5. The method further includes introducing a gaseous species including a selenide species and a carrier gas into the furnace and transferring thermal energy into the furnace to increase a temperature from a first temperature to a second temperature, the second temperature ranging from about 350° C. to about 450° C. to at least initiate formation of a copper indium diselenide film from the copper and indium composite structure on each of the substrates.

REFERENCES:
patent: 3520732 (1970-07-01), Nakayama et al.
patent: 3975211 (1976-08-01), Shirland
patent: 4062038 (1977-12-01), Cuomo et al.
patent: 4332974 (1982-06-01), Fraas
patent: 4335266 (1982-06-01), Mickelsen et al.
patent: 4441113 (1984-04-01), Madan
patent: 4442310 (1984-04-01), Carlson et al.
patent: 4461922 (1984-07-01), Gay et al.
patent: 4465575 (1984-08-01), Love et al.
patent: 4471155 (1984-09-01), Mohr et al.
patent: 4499658 (1985-02-01), Lewis
patent: 4507181 (1985-03-01), Nath et al.
patent: 4517403 (1985-05-01), Morel et al.
patent: 4518855 (1985-05-01), Malak
patent: 4532372 (1985-07-01), Nath et al.
patent: 4542255 (1985-09-01), Tanner et al.
patent: 4581108 (1986-04-01), Kapur et al.
patent: 4589194 (1986-05-01), Roy
patent: 4598306 (1986-07-01), Nath et al.
patent: 4599154 (1986-07-01), Bender et al.
patent: 4611091 (1986-09-01), Choudary et al.
patent: 4623601 (1986-11-01), Lewis et al.
patent: 4625070 (1986-11-01), Berman et al.
patent: 4638111 (1987-01-01), Gay
patent: 4661370 (1987-04-01), Tarrant
patent: 4663495 (1987-05-01), Berman et al.
patent: 4724011 (1988-02-01), Turner et al.
patent: 4727047 (1988-02-01), Bozler et al.
patent: 4751149 (1988-06-01), Vijayakumar et al.
patent: 4775425 (1988-10-01), Guha et al.
patent: 4798660 (1989-01-01), Ermer et al.
patent: 4816082 (1989-03-01), Guha et al.
patent: 4816420 (1989-03-01), Bozler et al.
patent: 4837182 (1989-06-01), Bozler et al.
patent: 4873118 (1989-10-01), Elias et al.
patent: 4915745 (1990-04-01), Pollock et al.
patent: 4950615 (1990-08-01), Basol et al.
patent: 4968354 (1990-11-01), Nishiura et al.
patent: 4996108 (1991-02-01), Divigalpitiya et al.
patent: 5008062 (1991-04-01), Anderson et al.
patent: 5011565 (1991-04-01), Dube et al.
patent: 5028274 (1991-07-01), Basol et al.
patent: 5039353 (1991-08-01), Schmitt
patent: 5045409 (1991-09-01), Eberspacher et al.
patent: 5078803 (1992-01-01), Pier et al.
patent: 5125984 (1992-06-01), Kruehler et al.
patent: 5133809 (1992-07-01), Sichanugrist et al.
patent: 5137835 (1992-08-01), Karg
patent: 5154777 (1992-10-01), Blackmom et al.
patent: 5180686 (1993-01-01), Banerjee et al.
patent: 5211824 (1993-05-01), Knapp
patent: 5217564 (1993-06-01), Bozler et al.
patent: 5231047 (1993-07-01), Ovshinsky et al.
patent: 5248345 (1993-09-01), Sichanugrist et al.
patent: 5261968 (1993-11-01), Jordan
patent: 5298086 (1994-03-01), Guha et al.
patent: 5336623 (1994-08-01), Sichanugrist et al.
patent: 5346853 (1994-09-01), Guha et al.
patent: 5397401 (1995-03-01), Toma et al.
patent: 5445847 (1995-08-01), Wada et al.
patent: 5474939 (1995-12-01), Pollock et al.
patent: 5501744 (1996-03-01), Albright et al.
patent: 5512107 (1996-04-01), Van den Berg
patent: 5528397 (1996-06-01), Zavracy et al.
patent: 5536333 (1996-07-01), Foote et al.
patent: 5578103 (1996-11-01), Araujo et al.
patent: 5578503 (1996-11-01), Karg et al.
patent: 5622634 (1997-04-01), Noma et al.
patent: 5626688 (1997-05-01), Probst et al.
patent: 5665175 (1997-09-01), Safir
patent: 5676766 (1997-10-01), Probst et al.
patent: 5726065 (1998-03-01), Szlufcik et al.
patent: 5738731 (1998-04-01), Shindo et al.
patent: 5868869 (1999-02-01), Albright et al.
patent: 5977476 (1999-11-01), Guha et al.
patent: 5981868 (1999-11-01), Kushiya et al.
patent: 5985691 (1999-11-01), Basol et al.
patent: 6040521 (2000-03-01), Kushiya et al.
patent: 6048442 (2000-04-01), Kushiya et al.
patent: 6092669 (2000-07-01), Kushiya et al.
patent: 6107562 (2000-08-01), Hashimoto et al.
patent: 6127202 (2000-10-01), Kapur et al.
patent: 6166319 (2000-12-01), Matsuyama
patent: 6172297 (2001-01-01), Hezel et al.
patent: 6258620 (2001-07-01), Morel et al.
patent: 6294274 (2001-09-01), Kawazoe et al.
patent: 6307148 (2001-10-01), Takeuchi et al.
patent: 6328871 (2001-12-01), Ding et al.
patent: RE37512 (2002-01-01), Szlufcik et al.
patent: 6361718 (2002-03-01), Shinmo et al.
patent: 6372538 (2002-04-01), Wendt et al.
patent: 6423565 (2002-07-01), Barth et al.
patent: 6632113 (2003-10-01), Noma et al.
patent: 6635307 (2003-10-01), Huang et al.
patent: 6653701 (2003-11-01), Yamazaki et al.
patent: 6667492 (2003-12-01), Kendall
patent: 6690041 (2004-02-01), Armstrong et al.
patent: 6784492 (2004-08-01), Morishita
patent: 6852920 (2005-02-01), Sager et al.
patent: 6878871 (2005-04-01), Scher et al.
patent: 6974976 (2005-12-01), Hollars
patent: 7122398 (2006-10-01), Pichler
patent: 7179677 (2007-02-01), Ramanathan et al.
patent: 7194197 (2007-03-01), Wendt et al.
patent: 7220321 (2007-05-01), Barth et al.
patent: 7235736 (2007-06-01), Buller et al.
patent: 7252923 (2007-08-01), Kobayashi
patent: 7265037 (2007-09-01), Yang et al.
patent: 7319190 (2008-01-01), Tuttle
patent: 7364808 (2008-04-01), Sato et al.
patent: 7441413 (2008-10-01), Bae et al.
patent: 7544884 (2009-06-01), Hollars
patent: 7736755 (2010-06-01), Igarashi et al.
patent: 7741560 (2010-06-01), Yonezawa
patent: 7855089 (2010-12-01), Farris, III et al.
patent: 7863074 (2011-01-01), Wieting
patent: 7910399 (2011-03-01), Wieting
patent: 7955891 (2011-06-01), Wieting
patent: 7960204 (2011-06-01), Lee
patent: 7993954 (2011-08-01), Wieting
patent: 7993955 (2011-08-01), Wieting
patent: 7998762 (2011-08-01), Lee et al.
patent: 8003430 (2011-08-01), Lee
patent: 8008110 (2011-08-01), Lee
patent: 8008111 (2011-08-01), Lee
patent: 8008112 (2011-08-01), Lee
patent: 8026122 (2011-09-01), Lee
patent: 2002/0002992 (2002-01-01), Kariya et al.
patent: 2002/0004302 (2002-01-01), Fukumoto et al.
patent: 2002/0061361 (2002-05-01), Nakahara et al.
patent: 2002/0063065 (2002-05-01), Sonoda et al.
patent: 2003/0075717 (2003-04-01), Kondo et al.
patent: 2003/0089899 (2003-05-01), Lieber et al.
patent: 2004/0063320 (2004-04-01), Hollars
patent: 2004/0084080 (2004-05-01), Sager et al.
patent: 2004/0095658 (2004-05-01), Buretea et al.
patent: 2004/0110393 (2004-06-01), Munzer et al.
patent: 2004/0187917 (2004-09-01), Pichler
patent: 2004/0245912 (2004-12-01), Thurk et al.
patent: 2004/0252488 (2004-12-01), Thurk
patent: 2004/0256001 (2004-12-01), Mitra et al.
patent: 2005/0074915 (2005-04-01), Tuttle et al.
patent: 2005/0098205 (2005-05-01), Roscheisen et al.
patent: 2005/0109392 (2005-05-01), Hollars
patent: 2005/0164432 (2005-07-01), Lieber et al.
patent: 2005/0194036 (2005-09-01), Basol
patent: 2005/0287717 (2005-12-01), Heald et al.
patent: 2006/0034065 (2006-02-01), Thurk
patent: 2006/0040103 (2006-02-01), Whiteford et al.
patent: 2006/0051505 (2006-03-01), Kortshagen et al.
patent: 2006/0096536 (2006-05-01), Tuttle
patent: 2006/0096537 (2006-05-01), Tuttle
patent: 2006/0096635 (2006-05-01), Tuttle
patent: 2006/0102230 (2006-05-01), Tuttle
patent: 2006/0130890 (2006-06-01), Hantschel et al.
patent: 2006/0160261 (2006-07-01), Sheats et al.
patent: 2006/0174932 (2006-08-01), Usui et al.
patent: 2006/0219288 (2006-10-01), Tuttle
patent: 2006/0219547 (2006-10-01), Tuttle
patent: 2006/0220059 (2006-10-01), Satoh et al.
patent: 2006/0249202 (2006-11-01), Yoo et al.
patent: 2006/0267054 (2006-11-0

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thermal management and method for large scale processing of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thermal management and method for large scale processing of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal management and method for large scale processing of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4299794

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.