Thermal interface wafer and method of making and using the same

Heat exchange – Heat transmitter

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C361S705000

Reexamination Certificate

active

06901997

ABSTRACT:
A thermal interface wafer for facilitating heat transfer from an electronic component to a heat sink. The wafer is formed from at least one elongate, vertically-oriented strip of thermally conductive material having a layer of conformable, heat-conducting material formed thereon. Preferably, the substrate comprises a metal foil, such as aluminum or some other thermally-conductive metal, that is formed as a flat, spiral-like coil. Such strip may further be configured to have a serpentine configuration, or may alternatively be formed from a multiplicity of strips. The present invention further provides for methods of transferring heat from an electronic component to a heat sink, as well as methods for fabricating the thermal interface wafers of the present invention.

REFERENCES:
patent: 2799793 (1957-07-01), De Cain
patent: 2887628 (1959-05-01), Zierdt, Jr.
patent: 3013104 (1961-12-01), Young
patent: 3249680 (1966-05-01), Sheets et al.
patent: 3356828 (1967-12-01), Furness
patent: 3391242 (1968-07-01), Sudges
patent: 3463140 (1969-08-01), Rollor, Jr.
patent: 3463151 (1969-08-01), Andrassy
patent: 3467547 (1969-09-01), Harvey et al.
patent: 3476177 (1969-11-01), Potzl
patent: 3586102 (1971-06-01), Gilles
patent: 3603106 (1971-09-01), Ryan
patent: 3819530 (1974-06-01), Ratledge et al.
patent: 3823089 (1974-07-01), Ryan et al.
patent: 3887628 (1975-06-01), Beckers
patent: 3972821 (1976-08-01), Weidenbenner et al.
patent: 4065908 (1978-01-01), Mueller
patent: 4139051 (1979-02-01), Jones et al.
patent: 4151547 (1979-04-01), Rhoades et al.
patent: 4199548 (1980-04-01), Raiho et al.
patent: 4237086 (1980-12-01), Gehle
patent: 4266267 (1981-05-01), Ruegg
patent: 4299715 (1981-11-01), Whitfield et al.
patent: 4360626 (1982-11-01), Manwiller
patent: 4466483 (1984-08-01), Whitfield et al.
patent: 4473113 (1984-09-01), Whitfield et al.
patent: 4489487 (1984-12-01), Bura
patent: 5002715 (1991-03-01), Grapes et al.
patent: 5051259 (1991-09-01), Olsen et al.
patent: 5060114 (1991-10-01), Feinberg et al.
patent: 5237086 (1993-08-01), Kruger et al.
patent: 5660917 (1997-08-01), Fujimori et al.
patent: 5783862 (1998-07-01), Deeney
patent: 5904796 (1999-05-01), Freuler et al.
patent: 5912805 (1999-06-01), Freuler et al.
patent: 5930715 (1999-07-01), Chambers
patent: 5931831 (1999-08-01), Linder
patent: 5986884 (1999-11-01), Jairazbhoy et al.
patent: 6037659 (2000-03-01), Weixel
patent: 6054198 (2000-04-01), Bunyan et al.
patent: 6391442 (2002-05-01), Duvall et al.
patent: 600823 (1960-06-01), None
patent: 2368529 (1976-10-01), None
patent: 1086003 (1967-10-01), None
“Thermal Properties of Materials”, webpage located at: http://www.ai.mit.edu/people/tk/tks/tcon.html, dated Sep. 6, 1994.
Power Devices, Inc.: “Kapton MT Substrates Coated with High Performance Thermal Compound in Easy-to-Use Form”; MCM-Strate; 1996.
Power Devices, Inc.; “Low Thermal Resistance and Excellent Electrical Insulation in One Clean, Reliable System”; ISOSTRATE: 1991.
Power Devices, Inc.; “Adhesive-backed Aluminum Substrate with High Performance Thermal Compound in Easy-to-Use Form”; MCM-STRATE; 1996.
Power Devices, Inc.; The Cost-Effective Soluction to Thermal Interface Problems—Clean, Dry and Easy to Use; THERMSTRATE; 1991.
Chomerics; “THERMATTACH 404 and 405 Thermally Conductive Adhesive Tapes”; CHO-THERM Thermal Interface Materials; Technical Bulletin 72; 1993.
Chomerics; “THERMATACH T413 and T414 Thermally Conductive Adhesive Tapes”; Preliminary Product Data Sheet; 1994.
Chomerics; “THERMFLOW T705 and T710 Low Thermal Resistance Interface Pads”; CHO-THERM Thermal Interface Material; Technical Bulletin 77; 1997.
The Bergquist Company; “SIL-PAD Design Guide”; Spring 1993.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thermal interface wafer and method of making and using the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thermal interface wafer and method of making and using the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal interface wafer and method of making and using the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3500451

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.