Thermal head having wear-resistant protective film

Details Thermal head having wear-resistant protective film Thermal head having wear-resistant protective film

2006-09-12

2006-09-12

McDonald, Rodney G. (Department: 1753)

Incremental printing of symbolic information

Thermal marking apparatus or processes

Specific resistance recording element type

C347S200000, C428S908800

Reexamination Certificate

active

07106356

ABSTRACT:
A method of producing a wear-resistant protective film for a thermal head comprises depositing a wear-resistant protective film by sputtering on a thermal head which includes a substrate, and a heat-developing layer and a pair of electrodes formed on either the substrate or a heat-regenerative layer formed thereon. A layer of the wear resistant protective film is formed under a RF larger bias and another layer without a bias or with a smaller bias. Good step coverage is obtained by the RF sputter layer of the wear-resistant and the protective film prevents the intrusion of water that can cause cracking, and the layer formed under no or smaller bias reduces internal stresses and inhibits the development of cracks due to internal stresses as well as the cracking by RF sputtering.

REFERENCES:
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patent: 4973388 (1990-11-01), Francois et al.
patent: 5062937 (1991-11-01), Komuro
patent: 5557313 (1996-09-01), Nakayama et al.
patent: 5590969 (1997-01-01), Nakayama et al.
patent: 57-185174 (1982-11-01), None
patent: 2-194628 (1990-08-01), None
Office Action from Counterpart Application No. 5,303,258 Dispatched Dec. 25, 2001.

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