Thermal head and method of manufacturing the same

Details Thermal head and method of manufacturing the same Thermal head and method of manufacturing the same

1987-03-04

1988-09-20

Swisher, Nancy A. B.

Stock material or miscellaneous articles

Composite

Of inorganic material

428701, 501 63, 427 34, 219216, 219543, H05B 100

Patent

active

047725206

ABSTRACT:
This invention discloses a thermal head having a resistive layer of a thin Ta-Si-O film containing more than 45 mol % and at most 75 mol % of a silicon oxide in terms of SiO.sub.2, and a method of manufacturing a thermal head by sputtering a sintered target in vacuum atmosphere at an argon gas partial pressure of 10.times.10.sup.-3 Torr to 80.times.10.sup.-3 Torr so as to obtain the resistive layer.

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patent: 4614689 (1986-09-01), Iheda et al.
patent: 4650726 (1987-03-01), Yamaguchi et al.

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