Thermal head and manufacturing method

Details Thermal head and manufacturing method Thermal head and manufacturing method

1993-10-20

1995-12-05

Tran, Huan H.

Incremental printing of symbolic information

Thermal marking apparatus or processes

Specific resistance recording element type

B41J 2335

Patent

active

054733570

ABSTRACT:
A thermal head having high heat resisting characteristics and heat response capable of being sufficiently adapted for finer printing and achieving high quality printing at a high speed, the substrate thereof being formed of silicon and the heat accumulation layer thereof being formed of silicon, at least one selected among from elements such as Ta, W, and Mo and oxygen.

REFERENCES:
patent: 4768038 (1988-08-01), Shibata
patent: 4795887 (1989-01-01), Myokan
patent: 4802080 (1989-01-01), Bossi et al.
patent: 4907015 (1990-03-01), Kaneko et al.
patent: 5099257 (1992-03-01), Nakazawa et al.
patent: 5156896 (1992-10-01), Katoh et al.
patent: 5162814 (1992-11-01), Shirakawa et al.
patent: 5182574 (1993-01-01), Kato et al.

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