Thermal development type diazo copying material with hydrophobic

Details Thermal development type diazo copying material with hydrophobic Thermal development type diazo copying material with hydrophobic

1982-06-02

1985-02-05

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Microcapsule, process, composition, or product

430151, 430158, 430160, 430162, 430176, 430179, 430346, 430348, 430541, 2503161, 2503171, 428913, 346 11, 346 76PH, 3461351, G03C 160, G03C 158

Patent

active

044978871

ABSTRACT:
A thermal development type diazo copying material comprising a support material and a photosensitive layer formed on the support material, which photosensitive layer comprises a diazo compound, a coupling component and a thermo-fusible auxiliary coloring agent, and which coupling component is capsulated by a hydrophobic polymeric material with a softening point ranging from 50.degree. C. to 150.degree. C. selected from the group consisting of hydrophobic polyester resins, hydrophobic cellulose resins, hydrophobic polyamide resins and hydrophobic polyurethane resins.

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patent: 3615537 (1971-10-01), Jacobus et al.
patent: 3642483 (1972-02-01), Kubo et al.
patent: 4400456 (1983-08-01), Matsuda et al.

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