Thermal development diazo copying material

Radiation imagery chemistry: process – composition – or product th – Microcapsule – process – composition – or product

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430157, 430159, 430160, 430171, 430180, G03C 172, G03C 160

Patent

active

054786894

ABSTRACT:
A thermal development diazo copying material is composed of a support, and a photosensitive layer formed thereon, which includes a diazo compound, a coupler, an alkali-soluble resin, and a sensitizer, with only the coupler being contained in microcapsules made of the alkali-soluble resin.

REFERENCES:
patent: 4659644 (1987-04-01), Hoshina et al.
patent: 4975353 (1990-12-01), Watanabe et al.
patent: 5047308 (1991-09-01), Usami
patent: 5089371 (1992-02-01), Nakamura et al.
patent: 5296329 (1994-03-01), Sugiyama et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Thermal development diazo copying material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thermal development diazo copying material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal development diazo copying material will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1368217

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.