Thermal development apparatus

Details Thermal development apparatus Thermal development apparatus

2005-04-26

2005-04-26

Tran, Huan (Department: 2861)

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

C347S156000, C430S336000

Reexamination Certificate

active

06885391

ABSTRACT:
There is described a thermal development apparatus, which makes it possible to prevent generation of density variations caused by changes of the processing temperature during the thermal developing operation when the thermal developing photosensitive material is continuously processed, without increasing the cost of the apparatus so much. The thermal development apparatus includes a thermal developing processor to apply a thermal development processing to the thermal developing photosensitive material, a detector to detect the thermal developing photosensitive material to be conveyed into the thermal developing processor and a controller to control the thermal developing processor in a feed forward controlling mode based on a processing condition of the thermal developing processor. The processing condition is established in advance, corresponding to a load of processing the thermal developing photosensitive material detected in advance by the detector.

REFERENCES:
patent: 5414488 (1995-05-01), Fujita et al.
patent: 6784911 (2004-08-01), Umeki et al.
patent: 20030118926 (2003-06-01), Sumi et al.

Affiliated with

Also associated with

Rating

Thermal development apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Thermal development apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thermal development apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3372395