Thermal detector comprising a thermal insulator made of expanded

Details Thermal detector comprising a thermal insulator made of expanded Thermal detector comprising a thermal insulator made of expanded

1995-02-15

1997-04-08

Breneman, R. Bruce

Etching a substrate: processes

Etching to produce porous or perforated article

438 55, 438 3, 438780, H01L 3118

Patent

active

056187378

ABSTRACT:
A thermal detector with a monolithic structure comprises a layer of material sensitive to infrared radiation and an insulating layer constituted by a thermostable polymer that can be deposited as a thin layer and has a microporous structure. This insulating layer enables the thermal decoupling of the sensitive layer from the substrate comprising reading circuits with which the detector is provided. The performance characteristics of currently used monolithic infrared detectors can thus be substantially improved through the notable reduction of the thermal losses in the sensitive layer. This is achieved through the greatly reduced thermal conductivity of the layer of dielectric polymer. Application to infrared imaging devices.

REFERENCES:
patent: 4740700 (1988-04-01), Shaham et al.
patent: 4904608 (1990-02-01), Gentner et al.
patent: 5039620 (1991-08-01), Yamazaki et al.

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