Thermal decomposition trap

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier

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Details

55269, 55300, 55355, 422307, 422310, F01N 310

Patent

active

051146835

ABSTRACT:
A thermal decomposition trap includes a trap main body (21) having an inlet port (26) for supplying a gas to be thermally decomposed and an outlet port (27) for exhausting the gas, and a heater (23, 25) for heating the gas supplied in the trap main body (21). An oil trap (28) containing an oil and having an oil discharge port (29) and a valve (V3) connected thereto is formed on a bottom portion of the trap main body (21). Particles generated by thermal decomposition of the gas are precipitated in the oil in the oil trap (28). The oil containing the particles is easily discharged in a short time period by opening the valve (V3) mounted on the oil discharge port (29). An oil-free auxiliary pump is arranged between a reaction chamber and the thermal decomposition trap, whereby a mass flow rate of exhaust from rate in the reaction chamber is not reduced regardless of the arrangement of the thermal decomposition trap.

REFERENCES:
patent: 514814 (1894-02-01), Cooper
patent: 1928706 (1933-10-01), Sillers
patent: 2045519 (1936-06-01), Coutant
patent: 3093466 (1963-06-01), Zankey
patent: 4183982 (1980-01-01), Kraus
John Wiley & Sons, New York, 1955, pp. 8-9, C. F. Powell et al., "Vapor-Plating".
Journal of Metals JOM, vol. 37, No. 6, Jun. 1985, pp. 63-71, Warrendale, Pennsylvania, US, M. L. Green et al., "Chemical Vapor Deposition of Metals for Integrated Circuit Applications".

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