Tetramethyl siloxane reaction

Details Tetramethyl siloxane reaction Tetramethyl siloxane reaction

2006-08-14

2010-11-09

Moore, Margaret G (Department: 1796)

Organic compounds -- part of the class 532-570 series

Organic compounds

Silicon containing

C556S445000, C528S015000

Reexamination Certificate

active

07829734

ABSTRACT:
An asymmetric siloxane is made by reacting a silicone having the formula MHDxM′Hwhere MHis R1R2HSiO1/2, M′His R4R5HSiO1/2and x is an integer 0≦x≦10 under selective hydrosilylation conditions in the presence of a precious metal hydrosilylation catalyst, with a first olefinic compound an in a second step, a monohydridosiloxane produced in the first step is reacted under hydrosilylating conditions with another olefinic compound different from the first olefinic compound.

REFERENCES:
patent: 3299112 (1967-01-01), Bailey
patent: 4262107 (1981-04-01), Eckberg
patent: 4340647 (1982-07-01), Eckberg
patent: 5026891 (1991-06-01), Colas et al.
patent: 5104647 (1992-04-01), Policello
patent: 5132047 (1992-07-01), Tanaka
patent: 5306838 (1994-04-01), Shioya et al.
patent: 5401871 (1995-03-01), Feldmann-Krane et al.
patent: 5430166 (1995-07-01), Klein et al.
patent: 5430167 (1995-07-01), Klein et al.
patent: 5484950 (1996-01-01), Crivello
patent: 5558806 (1996-09-01), Policello et al.
patent: 5574832 (1997-10-01), Kaye
patent: 5674832 (1997-10-01), Keys
patent: 5750589 (1998-05-01), Zech et al.
patent: 6060546 (2000-05-01), Powell et al.
patent: 6211284 (2001-04-01), Ishikawa et al.
patent: 6221811 (2001-04-01), Policello et al.
patent: 6255511 (2001-07-01), Klein et al.
patent: 6271295 (2001-08-01), Powell et al.
patent: 6300283 (2001-10-01), Sakuta
patent: 6489498 (2002-12-01), Klein et al.
patent: 6669949 (2003-12-01), Kennedy et al.
patent: 7259220 (2007-08-01), Farris et al.
patent: 7326761 (2008-02-01), Farris et al.
patent: 2007/0184005 (2007-08-01), Policello et al.
patent: 2007/0249560 (2007-10-01), Leatherman et al.
patent: 2008/0015323 (2008-01-01), Farris et al.
patent: 2008/0015324 (2008-01-01), Farris et al.
patent: 2008/0033136 (2008-02-01), Farris et al.
patent: 2008/0076894 (2008-03-01), Farris et al.
patent: 2008/0076895 (2008-03-01), Farris et al.
patent: 2008/0076896 (2008-03-01), Farris et al.
patent: 2008/0076939 (2008-03-01), Farris et al.
patent: 2008/0081924 (2008-04-01), Farris et al.
patent: 2008/0090964 (2008-04-01), Rajaraman et al.
patent: 4320920 (1994-06-01), None
patent: 4433139 (1996-03-01), None
patent: 0367381 (1990-05-01), None
patent: 0786515 (1997-07-01), None
patent: 0 710 500 (2000-11-01), None
patent: 1136515 (2001-09-01), None
patent: 1 520 421 (1978-08-01), None
patent: 02151873 (1990-06-01), None
patent: WO 2006/102050 (2006-09-01), None
patent: WO 2006/107082 (2006-10-01), None
patent: 2007/044552 (2007-04-01), None
R. Wagner et al., (1998). “Silicon-Modified Carbohydrate Surfactants VII: Impact of Different Silicon Substructures on the Wetting Behaviour of Carbohydrate Surfactants on Low-Energy Surfaces—Distance Decay of Donor-Acceptor Forces” Applied Organometallic Chemistry 12 265-276.
R. Wagner et al., (1997), “Silicon-Modified Carbohydrate Surfactants V: The Welling Behaviour of Low-Molecular-weight Siloxane, Carboailane, Silane and Polysilane Precursors on Low-Energy Surfaces”, Applied Organometallic Chemistry 11 645-657.
Maki, H. etal. “Syntheses and Properties of Surfactants Containing Organometals: IV.Organo Silicone,” Journal of the American Oil Chemists' Society, vol. 46, No. 12, 1969, pp. 635-638.
Greene, Theodora W., “Protective Groups in Organic Synthesis,” 1981, John Wiley & Sons, New York, XP002435637 p. 39, last paragraph, p. 44, second paragraph.

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