Optics: measuring and testing – Standard
Patent
1991-06-17
1992-01-07
McGraw, Vincent P.
Optics: measuring and testing
Standard
G01N 2188
Patent
active
050784927
ABSTRACT:
A patterned wafer for testing an optical scanner. The wafer has standard size light scattering features, such as pits, distributed in aligned groups arranged in annular bands about a concentric center. Empty annular bands separate the feature containing annular bands. The empty bands simulate wafer edges for various size wafers. In this manner, wafer edges may be excluded in a particle count for a predetermined size wafer. Apparent size variations in multiple scans indicate misalignments relative to the scan center.
REFERENCES:
patent: 4512659 (1985-04-01), Galbraith et al.
patent: 4636073 (1987-01-01), Williams
patent: 5004340 (1991-04-01), Tullis et al.
McGraw Vincent P.
VLSI Standards, Inc.
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