Test sample fabrication technique

Etching a substrate: processes – Forming or treating material useful in a capacitor

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438 51, 438 54, 216 2, H01G 900

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active

060997443

ABSTRACT:
A fabrication technique for a test sample to characterize pyroelectric and erroelectric thin films for use in uncooled infrared focal plane arrays operated at a nominal 60 Hz. Most layers are patterned by a lift off technique, and those layers that are not lifted off are chemically etched or ion milled. The pyroelectric layer is thermally insulated from the substrate by a thick film layer of ZrO.sub.2. The pyroelectric layer is sandwiched between metal layers to form a capacitor. Direct measurement of the voltages between the capacitor plates, and of the temperature of these plates, results in a direct measurement of thin film temperature responsivity.

REFERENCES:
patent: 5453347 (1995-09-01), Bullington et al.
patent: 5644838 (1997-07-01), Beratan
patent: 5757000 (1998-05-01), Rogowski et al.
patent: 5891512 (1999-04-01), Kawata et al.

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