Optics: measuring and testing – Lens or reflective image former testing
Reexamination Certificate
2007-12-25
2007-12-25
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Lens or reflective image former testing
Reexamination Certificate
active
11594075
ABSTRACT:
In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.
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Den Boef Arie Jeffrey
Dusa Mircea
Kiers Antoine Gaston Marie
Van Der Laan Hans
Van Dijsseldonk Antonius Johannes Josephus
ASML Netherlands B.V.
Merlino Amanda H
Pillsbury Winthrop Shaw & Pittman LLP
Toatley , Jr. Gregory J.
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