Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2006-12-12
2006-12-12
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S400000, C430S030000
Reexamination Certificate
active
07148959
ABSTRACT:
A method according to one embodiment of the invention may be applied to enhance scatterometry measurements made from a two-component test pattern. Reference patterns corresponding to each of the components of the two-component pattern are also printed. Scatterometry signals derived from the reference patterns, corresponding to the separate components of the test pattern, are used to enhance the signal from the test pattern to improve sensitivity and signal-to-noise ratios.
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patent: 2004-287400 (2004-10-01), None
patent: WO 02/065545 (2002-08-01), None
Niu et al., “Specular Spectroscopic Scatterometry in DUV Lithography,” SPIE, SPIE Conference on Metrology, Inspection, and Process Control for Microlithography XIII (Santa Clara, CA), p. 159-168, vol. 3677 (Mar. 1999).
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Den Boef Arie Jeffrey
Dusa Mircea
Pham Hoa Q.
Pillsbury Winthrop Shaw & Pittman LLP
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