Test pattern group and a method of measuring an insulation film

Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters

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438 18, 427 10, G01R 2726, H01L 2166

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active

058015388

ABSTRACT:
The present invention relates to a test pattern group and a method for measuring an insulation film thickness utilizing the same, and to the test pattern group comprising at least 3 (three) test patterns having a construction of a capacitor and a method for more precisely measuring the insulation film thickness utilizing the test pattern group, in a method for electrically measuring a capacitance of the insulation film applied to a semiconductor device and converting the measured capacitance to a thickness of the insulating film.

REFERENCES:
patent: 4990218 (1991-02-01), Tezaki et al.
patent: 5477325 (1995-12-01), Miyashita et al.
patent: 5545224 (1996-08-01), Gabriel et al.
patent: 5593903 (1997-01-01), Beckenbaugh et al.
patent: 5627083 (1997-05-01), Tounai

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