Test pattern for separately determining plug resistance and inte

Details Test pattern for separately determining plug resistance and inte Test pattern for separately determining plug resistance and inte

1996-10-01

1997-06-17

Wieder, Kenneth A.

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

324719, G01R 2708

Patent

active

056400977

ABSTRACT:
A test pattern for contact resistance, includes a contact hole section, and first to fourth electrode pad patterns connected to the contact hole section. The contact hole section includes first and second semiconductor region patterns apart from each other, first and second metal patterns provided above the first and second semiconductor region patterns via an insulating film apart from each other such that each of the first and second metal patterns overlaps the first and second semiconductor region patterns, first and second contact holes each having a plug structure, filled with a conductive material, and respectively provided to connect between the first semiconductor region pattern and the first and second metal patterns, the first and second contact holes having first and second depths, respectively, third and fourth contact holes each having the plug structure, filled with the conductive material, and respectively provided to connect between the second semiconductor region pattern and the first and second metal patterns, the third and fourth contact holes having the second and first depths, respectively, and fifth and sixth contact holes provided to connect between the first and second semiconductor regions patterns and the first and second electrode pad patterns, respectively, wherein the third and fourth electrode pad patterns are connected to the first and second metal patterns, respectively.

REFERENCES:
patent: 5450016 (1995-09-01), Masumori

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