Test method and apparatus for a reticle or mask pattern used in

Details Test method and apparatus for a reticle or mask pattern used in Test method and apparatus for a reticle or mask pattern used in

1987-07-13

1989-02-28

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

358106, 382 30, 382 47, G06K 900

Patent

active

048093416

ABSTRACT:
A test method and apparatus for a reticle/mask pattern used for a semiconductor fabrication is disclosed for a case in which the reticle/mask pattern is modified from the original design data and has a reduced/magnified pattern in a similar shape. The reticle/mask pattern is scanned and detected optically and electrically, and detected signal is converted to video signal and is stored as a real image pattern data in a first video memory. The original pattern data stored in a magnetic tape is read and converted to video signal, and is stored as an original design pattern data in a second video memory. After graphical operation of the original design pattern data in the second video memory, a group of modified pattern data having a gradual change of reduction/magnification ratio can be obtained. One modified pattern data having substantially same reduction/magnification ratio with reticle/mask pattern, is selected. The real image pattern of reticle/mask stored in the first video memory is compared with the above selected modified pattern data, thereby the inspection of the reticle/mask can be performed.

REFERENCES:
patent: 4179685 (1979-12-01), O'Maley
patent: 4486775 (1984-12-01), Catlow
patent: 4589140 (1986-05-01), Bishop et al.
patent: 4603974 (1986-08-01), Matsui
patent: 4641353 (1987-02-01), Kobayashi
patent: 4701961 (1987-10-01), Hongo
patent: 4712102 (1987-12-01), Troupes et al.

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