Test mask for optical and electron optical systems

Details Test mask for optical and electron optical systems Test mask for optical and electron optical systems

2006-06-15

2008-08-26

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C257S048000

Reexamination Certificate

active

07416819

ABSTRACT:
A test mask1for microscopy is disclosed, which is formed on a substrate of quartz. The test mask1comprises a multiplicity of sub-masks4, which are implemented such that each sub-mask4comprises structures which differ within a sub-mask4with regard to form and size. In addition, the structures of the individual sub-masks4are designed for optical or particle optical measurements according to size.

REFERENCES:
patent: 6214494 (2001-04-01), Bula et al.
patent: 7175945 (2007-02-01), Mieher et al.
patent: 7266800 (2007-09-01), Sezginer

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