Test mask for determining alignment of an automatic IC mask test

Details Test mask for determining alignment of an automatic IC mask test Test mask for determining alignment of an automatic IC mask test

1986-07-14

1987-12-01

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428212, 356401, G03F 900

Patent

active

047104406

ABSTRACT:
A test mask is provided for determining that an automatic IC photomask testing machine is scanning within a desired die area. The test mask includes a plurality of care areas which correspond to the die areas of a mask to be tested. The peripheral region surrounding each care area includes portions which may be opaque and portions which may be transparent. These opaque and transparent portions are arranged so that when two care areas are being scanned and the scan improperly leaves the care area and enters the peripheral region, the portion of the peripheral region of the one care area being scanned is opaque while the portion of the peripheral region of the other care area is transparent. This will be interpreted by the mask testing machine as an error and will therefor be indicative that the machine will scan outside of the desired die areas when testing an IC photomask.

REFERENCES:
patent: 3771872 (1973-11-01), Nightingale et al.
patent: 3963354 (1976-06-01), Feldman et al.
patent: 4218142 (1980-08-01), Kryger et al.
patent: 4423959 (1984-01-01), Nakazawa et al.
patent: 4441250 (1984-04-01), Imahashi
patent: 4532650 (1985-07-01), Wihl et al.
Oldham, W. G., "The Fabrication of Microelectronic Circuits", Scientific American, vol. 237, (3), Sep. 1977, p. 110.
Automated Photomask Inspection: Current Techniques and Trends, George W. Brooks, Microelectronics Manufacturing and Testing, Sep. 1982.

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