Tertiary (meth)acrylates having lactone structure, polymers,...

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...

Reexamination Certificate

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C526S268000, C526S270000, C526S281000, C526S282000, C526S284000, C526S320000, C549S295000, C549S297000, C549S300000, C430S270100

Reexamination Certificate

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07037995

ABSTRACT:
Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

REFERENCES:
patent: 6517994 (2003-02-01), Watanabe
patent: 6639084 (2003-10-01), Maeda et al.
patent: 4-39665 (1992-02-01), None
patent: 9-95479 (1997-04-01), None
patent: 9-208554 (1997-08-01), None
patent: 9-230588 (1997-09-01), None
patent: 10-10739 (1998-01-01), None

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