Organic compounds -- part of the class 532-570 series – Organic compounds – Carboxylic acids and salts thereof
Reexamination Certificate
2008-05-27
2008-05-27
Puttlitz, Karl (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Carboxylic acids and salts thereof
Reexamination Certificate
active
11423524
ABSTRACT:
The present invention provides ester group-containing tertiary amine compounds of the formula (R1OCH2CH2)nN(CH2CH2CO2R2)3-nwhich, when used as additives in chemical amplification photolithography, can yield photoresists having a high resolution and an excellent focus margin. The present invention also provides a process comprising the step of subjecting a primary or secondary amine compound to Michael addition to an acrylic ester compound; a process comprising the steps of subjecting monoethanolamine or diethanolamine to Michael addition to an acrylic ester compound so as to form an ester group-containing amine compound and introducing a R1group to the resultant ester group-containing amine compound; and a process comprising the step of effecting the ester exchange reaction of an ester group-containing tertiary amine with R2OH.
REFERENCES:
patent: 2729622 (1956-01-01), Albisetti et al.
patent: 4115232 (1978-09-01), Nyi et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 5023283 (1991-06-01), Ravichandran et al.
patent: 5580695 (1996-12-01), Murata et al.
patent: 5609989 (1997-03-01), Bantu et al.
patent: 5968712 (1999-10-01), Thackeray et al.
patent: 6673511 (2004-01-01), Hatakeyama et al.
patent: 2001/0038964 (2001-11-01), Thackery et al.
patent: 0 412 457 (1991-02-01), None
patent: 0 537 524 (1993-04-01), None
patent: 0 558 280 (1993-09-01), None
patent: 0 249 139 (1994-07-01), None
patent: 63-149640 (1988-06-01), None
patent: 63-170341 (1988-07-01), None
patent: 5-113666 (1993-05-01), None
patent: 2001064243 (2001-03-01), None
patent: WO 98/37458 (1998-08-01), None
Sashiwa et al., Carbohydrate Polymers (2002), 49(2), 195-205.
Hughes et al., J. Med. Chem., 1971, 14(9), 894-895.
Yu et al., Izvestiya Akademii Nauk Kazakhskoi SSR, Seriya Khimicheskaya (1984), (5), 81-5.
Hinsberg et al., “Fundamental Studies of Airborne Chemical Contamination of Chemically Amplified Resists,”Journal of Photopolymer Science and Technology, vol. 6, No. 4, pp. 535-546 (1993).
Kumada et al., “Study on Over-Top Coating of Positive Chemical Amplification Resists for KrF Excimer Laser Lithography,”Journal of Photopolymer Science and Technology, vol. 6, No. 4, pp. 571-574 (1993).
Hatakeyama et al., “Investigation of Discrimination Enhancement of Polysilsesquioxane Based Positive Resist for ArF Lithography,”SPIE, vol. 3333, pp. 62-72 (1998).
Hatakeyame et al., “Investigation of Discrimination Enhancement with New Modeling for Poly-Hydroxystyrene Positive Resists,”Journal of Photopolymer Science and Technology, vol. 13, No. 4, pp. 519-524 (2000).
Hughes et al., Synthesis and peripheral vasodilatator activity of alpa-(1-(4-piperidylamino)alkyl)benzyl alcohols,Journal of Medicinal Chemistry, vol. 14, No. 9, 1971, XP002249251 American Chemical Society, Washington, US ISSN: 0022-2623, p. 895.
Patent Abstracts of Japan, vol. 2000, No. 24, May 11, 2001 & JP 2001 194776 (Shin Etsu Chem Co Ltd) Jul. 19, 2001.
Hasegawa Koji
Hatakeyama Jun
Kinsho Takeshi
Watanabe Takeru
Alston & Bird LLP
Puttlitz Karl
Shin-Etsu Chemical Co. , Ltd.
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