Compositions – Co – s – negative element – or acid – bindant containing
Patent
1987-02-05
1989-03-21
Thexton, Matthew A.
Compositions
Co, s, negative element, or acid, bindant containing
252190, C09K 300
Patent
active
048141046
ABSTRACT:
Absorption of carbon dioxide from gas mixtures with aqueous absorbent solutions of tertiary alkanolamines is improved by incorporating at least one alkyleneamine in the solution. The presence of the alkyleneamine promotes the rate of carbon dioxide absorption and the carbon dioxide capacity of the aqueous tertiary alkanolamine solution. As a result, absorption can be carried out in shorter absorber columns, and process energy requirements can be lowered by reducing the rate at which the absorbent solution is circulated.
REFERENCES:
patent: 2946652 (1960-07-01), Bloch
patent: 3535260 (1970-10-01), Singh
patent: 3653810 (1972-04-01), Bratzler et al.
patent: 4094957 (1978-05-01), Sartori
patent: 4112052 (1978-09-01), Sartori
patent: 4217237 (1980-08-01), Sartori
patent: 4240922 (1980-12-01), Sartori et al.
patent: 4336233 (1982-06-01), Appl et al.
patent: 4405479 (1983-09-01), Sartori
patent: 4405577 (1983-09-01), Sartori
patent: 4405578 (1983-09-01), Sartori
patent: 4578517 (1986-03-01), Johnson et al.
Promotion of CO.sub.2 Mass Transfer in Carbonate Solutions--Chemical Engineering Science, vol. 36, pp. 581-588 (1981).
Sterically Hindered Amines for CO.sub.2 Removal from Gases, Ind. Engr. Chem. Fund., vol. 22, pp. 239-249 (1983).
Kovach Debra S.
Kubek Daniel J.
Lieberstein E.
Thexton Matthew A.
UOP
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