Terpolymer resist compositions

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Mixing of two or more solid polymers; mixing of solid...

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Details

20415914, 20415921, 20415922, 430286, C08L 6110, C08G 202

Patent

active

043980015

ABSTRACT:
A resist sensitive to electron beam (and X-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefin is hydrocarbon and an unsaturated ether.

REFERENCES:
patent: 3684770 (1972-08-01), Hammer
patent: 3893127 (1975-07-01), Kaplan et al.
patent: 3898350 (1975-08-01), Gipstein et al.

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