Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Patent
1994-12-28
1996-08-13
Chapman, Mark
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
522 14, 522 25, 522 26, 4302701, 4302811, 430915, 430919, C08F 246
Patent
active
055456766
ABSTRACT:
Photocurable addition-polymerizable compositions containing a free-radically-polymerizable monomer and a photoinitiator system containing i) an arylidonium salt, ii) a sensitizing compound, and iii) an electron donor having an oxidation potential that is greater than zero and less than or equal to that of p-dimethyoxybenzene (1.32 volts vs. S.C.E.). The compositions cure rapidly and deeply under ultraviolet or visible light.
REFERENCES:
patent: 3427161 (1969-02-01), Urbain
patent: 3479185 (1969-11-01), Chambers
patent: 3729313 (1973-04-01), Smith
patent: 3741769 (1973-06-01), Smith
patent: 3756827 (1973-09-01), Chang
patent: 3759807 (1973-09-01), Osborn
patent: 3778274 (1973-12-01), Inoue et al.
patent: 3808006 (1974-04-01), Smith
patent: 3933682 (1976-01-01), Bean
patent: 4011063 (1977-03-01), Johnston
patent: 4047903 (1977-09-01), Hesse et al.
patent: 4069054 (1978-01-01), Smith
patent: 4071424 (1978-01-01), Dart
patent: 4126428 (1978-11-01), Rude
patent: 4156035 (1979-05-01), Tsao et al.
patent: 4228232 (1980-10-01), Rosseau
patent: 4240807 (1980-12-01), Kronzer
patent: 4250053 (1981-02-01), Smith
patent: 4284551 (1981-08-01), Argentar
patent: 4298356 (1981-11-01), Teschner et al.
patent: 4351708 (1982-09-01), Berner et al.
patent: 4394403 (1983-07-01), Smith
patent: 4407984 (1983-10-01), Ratcliffe
patent: 4428807 (1984-01-01), Lee et al.
patent: 4457766 (1984-07-01), Caul
patent: 4476215 (1984-10-01), Kausch
patent: 4503169 (1985-03-01), Randklev
patent: 4507382 (1985-03-01), Rousseau
patent: 4535052 (1985-08-01), Anderson et al.
patent: 4547204 (1985-10-01), Caul
patent: 4576975 (1986-03-01), Reilly
patent: 4642126 (1987-02-01), Zador et al.
patent: 4652274 (1987-03-01), Boettcher et al.
patent: 4694029 (1987-09-01), Land
patent: 4719149 (1988-01-01), Aasen et al.
patent: 4735632 (1988-04-01), Oxman et al.
patent: 4889792 (1989-12-01), Palazzotto
patent: 5154762 (1992-10-01), Mitra et al.
Baumann, H., U. Oertel and H. J. Timpe, Euro. Polm. J., 22(4), 313 (Apr. 3, 1986).
Baumann, H., B. Strehmel, H. J. Timpe and U. Lammel, J. Prakt. Chem, 326, (3) 415-425 (1984).
Bull. Chem. Soc. Japan, 42, 2924-2930 (1969).
Chem. Abs. 95:225704U.
Crivello, J. V., Lee, J. L. and Conlon, D. A., J. Rad. Curing, 10, (1), 6-13 (Jan. 1983).
Gatechair, L. R. and Pappas, S. P., Organic Coatings and Applied Polymer Science Proceedings, 46, 701-707 (ACS, 183rd National Meeting, Las Vegas, Nevada, Mar. 29, 1982).
Perkins, W. C., J. Rad. Curing, 8, (1), 1623 (Jan. 1981).
Mann, C. K. and Barnes, K. K., Electrochemical Reactions in Nonaqueous Systems (1970), Marcel Dekker, Inc., New York, pp. 8-9.
Timpe, H. J. and Baumann, H., Wiss. Z. Tech. Hochsch. Leunn-Merseberg, 26, 439 (1984).
Weinburg, N. L., Ed., Technique of Electroorganic Synthesis Part II Techniques of Chemistry, vol. V, p. 8, (1975) Part II.
Crivello, J. V. and Lam, J. K. w., Journal of Polymer Science: Polymer Letters Edition, 17, 759-764 (1979).
Brauer et al., J. Polym. Sci., 19, 311 (1956).
Chem, J. Polm. Sci.: Part A, 3, 1807 (1965).
Chaberek et al., J. Phys. Chem., 69, 641 (1965):id, 69, 647 (1965); id, 69, 2834 (1965).
Cohen et al., Chem. Rev., 73, 141 (1973).
Crivello et al., J. Polym. Sci. Polym. Chem., 16, 2441 (1979); id, 17, 1047 (1979); id, 17, 1059 (1979); id, 18, 1021 (1980).
Foreman et al., JACS, 102, 1170 (1980).
Guttenplan et al., JACS, 94, 4040 (1972).
Ledweth, The Exiplex, 209 (1975).
Ledweth, J. Oil Col. Chem. Assoc., 59, 157 (1976); id, 61, 95 (1978).
Margerum et al., Photogr. Sci. Eng, 12, 177 (1968).
Margerum et al., J. Phys. Chem., 75, 3066 (1971).
Overberger et al., J. Polym. Sci., 40, 179 (1959).
Rust et al., Polym. Eng. Sci., 9, 40 (1969).
Williams et al., Polym. Eng. Sci., 23, 1022 (1983).
Yamese et al., Photogr. Sci. Eng., 17, 28 (1973); id 17, 268 (1973); id 18, 25 (1974); id 18, 647 (1974); AND ID 19, 57 (1975).
Chemical Abstract #413484 of vol. 106, 1986.
Kosar, "Light Sensitive Systems", pp. 54-61, 165, John Wiley & Sons, NY.
Kosar, "Light Sensitive Systems", Wiley & Sons, 1985, pp. 180, 181.
Roffey, "Photopolymerization of Surface Coatings", Wiley & Sons, 1982, pp. 70, 71, 76, 77, 78, 88-89.
Weinberg, "Techniques of Chemistry", vol. V, Part 1, "Technique of Electroorganic Synthesis", Wiley & Sons, 1974, pp. 438, 519.
Ali M. Zaki
Oxman Joel D.
Palazzotto Michael C.
Ubel, III F. Andrew
Bjorkman Dale A.
Chapman Mark
Griswold Gary L.
Kirn Walter N.
Minnesota Mining and Manufacturing Company
LandOfFree
Ternary photoinitiator system for addition polymerization does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Ternary photoinitiator system for addition polymerization, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Ternary photoinitiator system for addition polymerization will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1048325