Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor
Reexamination Certificate
2011-05-10
2011-05-10
Dang, Phuc T (Department: 2892)
Active solid-state devices (e.g., transistors, solid-state diode
Heterojunction device
Field effect transistor
C257S076000, C257S188000
Reexamination Certificate
active
07939853
ABSTRACT:
A semiconductor device is provided that includes a substrate, a first active layer disposed over the substrate, and a second active layer disposed on the first active layer. The second active layer has a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer. A termination layer, which is disposed on the second active layer, includes InGaN. Source, gate and drain contacts are disposed on the termination layer.
REFERENCES:
patent: 7026665 (2006-04-01), Smart et al.
patent: 2006/0108606 (2006-05-01), Saxler et al.
patent: 2006/0244010 (2006-11-01), Saxler
Murphy Michael
Pophristic Milan
Dang Phuc T
Power Integrations, Inc.
The Law Offices of Bradley J. Bereznak
LandOfFree
Termination and contact structures for a high voltage... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Termination and contact structures for a high voltage..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Termination and contact structures for a high voltage... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2688872