TEOS-O.sub.3 oxidizing film depositing system and process for su

Details TEOS-O.sub.3 oxidizing film depositing system and process for su TEOS-O.sub.3 oxidizing film depositing system and process for su

1999-01-27

1999-12-21

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, C23C 1600

Patent

active

060043970

ABSTRACT:
A method and apparatus for controlling the amount of ozone concentration in the layers of a film depositing system and the multi-layered structure produced thereby, whereby the concentration of ozone in each layer gradually changes from a low ozone concentration in the first deposited layer to a high ozone concentration in the last deposited layer.

REFERENCES:
patent: 5051380 (1991-09-01), Maeda
patent: 5288518 (1994-02-01), Homma
patent: 5632868 (1997-05-01), Harada et al.

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