Tensile-stressed microelectromechanical apparatus and...

Details Tensile-stressed microelectromechanical apparatus and... Tensile-stressed microelectromechanical apparatus and...

2006-05-16

2006-05-16

Barrera, Ramon M. (Department: 2832)

Optical: systems and elements

Deflection using a moving element

By moving a reflective element

C335S078000

Reexamination Certificate

active

07046411

ABSTRACT:
A microelectromechanical (MEM) apparatus is disclosed which includes one or more tensile-stressed actuators that are coupled through flexures to a stage on a substrate. The tensile-stressed actuators, which can be formed from tensile-stressed tungsten or silicon nitride, initially raise the stage above the substrate without any applied electrical voltage, and can then be used to control the height or tilt angle of the stage. An electrostatic actuator can also be used in combination with each tensile-stressed actuator. The MEM apparatus has applications for forming piston micromirrors or tiltable micromirrors and independently addressable arrays of such devices.

REFERENCES:
patent: 6023121 (2000-02-01), Dhuler et al.
patent: 6300665 (2001-10-01), Peeters et al.
patent: 6368414 (2002-04-01), Johnson
patent: 6545385 (2003-04-01), Miller et al.
patent: 6647164 (2003-11-01), Weaver et al.
patent: 2004/0165243 (2004-08-01), Helmbrecht
Weider Tang, et al, “Novel multi-user-MEMS-processes-compatible single-layer out-of-plane electrothermal actuator” Society of Photo-Optical Instrumentation Engineers, 2003, vol. 2, No. 2, pp. 91-95.
S. Habermehl, “Stress relaxation in Si-rich silicon nitride thin films,” Journal of Applied Physics, vol. 83, No. 9, May 1, 1998 pp. 4672-4677.

Affiliated with

Also associated with

Rating

Tensile-stressed microelectromechanical apparatus and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Tensile-stressed microelectromechanical apparatus and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tensile-stressed microelectromechanical apparatus and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3579535