Temporary modification of a pattern mask for use in forming a co

Details Temporary modification of a pattern mask for use in forming a co Temporary modification of a pattern mask for use in forming a co

1974-11-04

1976-01-06

Pianalto, Bernard D.

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Physical dimension specified

427 64, 427346, 428442, 428522, H01J 3100

Patent

active

039314421

ABSTRACT:
The invention provides a temporary light attenuation coating modification of the apertures in a multi-apertured pattern member for utilization in selected steps of the procedure for fabricating a patterned color screen structure disposed on the interior surface of a cathode ray tube viewing panel. The modification is in the form of a dried coating of a water-soluble polyhydric secondary alcohol uniformly covering the apertured portion of the pattern member to effect a bridging meniscus of coating in each of the apertures. Dissolved in the coating vehicle is a homogeneous dispersion of a ultraviolet absorbing material. Each attenuating meniscus effects a differential or graded degree of uv absorption resultant of the inherent variation in thickness of the bridging formation and the amount of uv absorber dissolved therein. In addition, the absorptive coating residual on the interstitial areas defining the apertures reduces deleterious reflections of actinic radiation during screen structure fabrication.

REFERENCES:
patent: 3616732 (1971-11-01), Ruciniki
patent: 3645734 (1972-02-01), Noguchi
patent: 3653900 (1972-04-01), Black
patent: 3653901 (1972-04-01), Etter
patent: 3703374 (1972-11-01), Okabe et al.
patent: 3725065 (1973-04-01), Fadner
patent: 3770434 (1973-11-01), Law
patent: 3775116 (1973-11-01), Takemoto

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