Temperature setting method of thermal processing plate,...

Details Temperature setting method of thermal processing plate,... Temperature setting method of thermal processing plate,...

2011-03-01

2011-03-01

Hoang, Tu B (Department: 3742)

Electric heating

Heating devices

With power supply and voltage or current regulation or...

C219S494000, C392S418000

Reexamination Certificate

active

07897896

ABSTRACT:
In the present invention, a thermal plate of a heating unit is divided into a plurality of thermal plate regions, and a temperature can be set for each of the thermal plate regions. A temperature correction value for adjusting a temperature within the thermal plate can be set for each of the thermal plate regions of the thermal plate. The line widths within the substrate which has been subjected to a photolithography process are measured, and, from an in-plane tendency of the measured line widths, an in-plane tendency improvable by temperature correction and an unimprovable in-plane tendency are calculated using a Zernike polynomial. An average remaining tendency of the improvable in-plane tendency after improvement obtained in advance is added to the unimprovable in-plane tendency to estimate an in-plane tendency of the line widths within the substrate after change of temperature setting.

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