Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1979-10-02
1981-03-17
Kaplan, Morris
Coating apparatus
Gas or vapor deposition
Multizone chamber
118724, 432 65, 432 83, C23C 1308, F27D 1502, F27D 1300, B05C 500
Patent
active
042560527
ABSTRACT:
A diffusion furnace having particular utility in the processing of SOS devices wherein a temperature gradient, per unit length of furnace tube, is provided at a section of a reaction tube extending between the furnace and the scavenger and load-unload chambers in order to minimize the thermal shock to which a sapphire wafer may be subject, either at the commencement of processing when the wafer is first introduced into the furnace or at the conclusion of the processing as the wafer is being withdrawn from the furnace.
REFERENCES:
patent: 1965059 (1934-07-01), Seibt
patent: 3086882 (1963-04-01), Smith, Jr. et al.
patent: 3183131 (1965-05-01), Huffman
patent: 3672948 (1972-06-01), Foehring et al.
patent: 3828722 (1974-08-01), Reuter et al.
patent: 3893876 (1975-07-01), Akai et al.
patent: 4129090 (1978-12-01), Inaniwa et al.
IBM Technical Disclosure Bulletin, vol. 15, No. 2, Jul. 1972, Benjamin, C. F. "Plug-Type Vacuum Diffusion System", pp. 414-415.
IBM Technical Disclosure Bulletin, vol. 16, No. 4, pp. 1220-1221, Zirinsky, "Retort for Pyrolytic Vapor Deposition of Thin Films".
Biondi Dennis P.
Johnson Raymond V.
Benjamin Lawrence P.
Cohen D. S.
Kaplan Morris
Morris Birgit E.
RCA Corp.
LandOfFree
Temperature gradient means in reactor tube of vapor deposition a does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Temperature gradient means in reactor tube of vapor deposition a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Temperature gradient means in reactor tube of vapor deposition a will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1640509