Temperature effects on overlay accuracy

Details Temperature effects on overlay accuracy Temperature effects on overlay accuracy

2011-04-12

2011-04-12

Kim, Peter B (Department: 2882)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S077000

Reexamination Certificate

active

07924408

ABSTRACT:
A method for reducing overlay error in a photolithographic process, by providing a substrate having a permanent layer with a first pattern disposed therein, coating the substrate with photoresist, exposing the photoresist to a second pattern, while measuring temperatures at a plurality of different first positions across the substrate, developing the second pattern in the photoresist, measuring overlay errors between the first and second patterns at a plurality of different second positions across the substrate, correlating the overlay errors with temperatures by position on the substrate, determining any relationship indicated between the correlated overlay errors and temperatures, and adjusting at least one temperature controlling aspect of the photolithographic process in response to any relationship determined.

REFERENCES:
patent: 6325536 (2001-12-01), Renken et al.
patent: 6577914 (2003-06-01), Bode
patent: 7065737 (2006-06-01), Phan et al.
patent: 2005/0272221 (2005-12-01), Yen et al.

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