Temperature controlling device for mask and wafer holders

Heat exchange – With timer – programmer – time delay – or condition responsive... – Temperature responsive or control

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Details

165101, 16510432, 16510433, 378 34, 378 35, 378208, 2504431, F28D 1500

Patent

active

055775527

ABSTRACT:
A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.

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McCoy et al. "Mash Alignment For The Fabrication of Integrated Circuits Using X-Ray Lithography" Solid State Technology Sep. 1976 pp. 59-64, (Copy in 378-34).
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