Heat exchange – With timer – programmer – time delay – or condition responsive... – Temperature responsive or control
Patent
1995-03-28
1996-11-26
Ford, John K.
Heat exchange
With timer, programmer, time delay, or condition responsive...
Temperature responsive or control
165101, 16510432, 16510433, 378 34, 378 35, 378208, 2504431, F28D 1500
Patent
active
055775527
ABSTRACT:
A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.
REFERENCES:
patent: 1393479 (1921-10-01), Zarucha
patent: 1621620 (1927-03-01), Bast
patent: 1713776 (1929-05-01), Moore
patent: 1827568 (1931-10-01), Donadio
patent: 1997003 (1935-04-01), Marguard
patent: 2366089 (1944-12-01), Dewan
patent: 3167113 (1965-01-01), Kleiss
patent: 3360032 (1967-12-01), Sherwood
patent: 3586101 (1971-06-01), Chu
patent: 3609991 (1971-10-01), Chu et al.
patent: 3624390 (1971-11-01), Watanabe
patent: 3719502 (1973-03-01), Keely
patent: 3871444 (1975-03-01), Houser et al.
patent: 4852133 (1989-07-01), Ikeda et al.
patent: 4865123 (1989-09-01), Kawashima et al.
patent: 4881591 (1989-11-01), Rignall
patent: 4916322 (1990-04-01), Glavish et al.
patent: 5063582 (1991-11-01), Mori et al.
McCoy et al. "Mash Alignment For The Fabrication of Integrated Circuits Using X-Ray Lithography" Solid State Technology Sep. 1976 pp. 59-64, (Copy in 378-34).
Hughes "X-Ray Lithography For IC Processing" Solid State Technology May 1977 vol. 20, No. 5 pp. 39-42 (Copy in 378-34).
Kunststoffberater, vol. 33, No. 5, May 1988, p. 42, B. Melz et al. (translation).
Ebinuma Ryuichi
Kariya Takao
Mizusawa Nobutoshi
Sakamoto Eiji
Uda Koji
Canon Kabushiki Kaisha
Ford John K.
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