Temperature control system

Details Temperature control system Temperature control system

1975-07-28

1977-12-06

Envall, Jr., R. N.

F27B 500, F27D 1900

Patent

active

040618706

ABSTRACT:
A system for controlling the temperature and/or temperature distribution in a semiconductor diffusion furnace. The temperature and/or temperature distribution inside the reactor tube of the furnace is directly detected by thermocouple means inserted in the reactor tube, and correction is effected with respect to the temperature and/or temperature distribution on the basis of the foregoing detection. There are also disclosed thermocouple devices for use with the aforementioned control system. Each of the thermocouple devices can be manufactured at lower cost and is arranged to provide for a high freedom of measurements.

REFERENCES:
patent: 3370120 (1968-02-01), Lasch, Jr.
patent: 3385921 (1968-05-01), Hampton
patent: 3512413 (1970-05-01), Von Krusenstierna et al.

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